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SUNY Poly, GloFo to partner on $500M lithography center

SUNY Poly, GloFo to partner on $500M lithography center

The SUNY Polytechnic Institute and GlobalFoundries will partner on a $500 million advanced lithograp
SUNY Poly, GloFo to partner on $500M lithography center
A look inside an existing extreme ultraviolet lithography research facility in the NanoFab Xtension building.

The SUNY Polytechnic Institute and GlobalFoundries will partner on a $500 million advanced lithography center at the College of Nanoscale Science and Engineering.

The Advanced Patterning and Productivity Center will bring extreme ultraviolet lithography technologies from the research lab into commercial semiconductor manufacturing over the next five years, with the goal of installing it at GlobalFoundries Fab 8 in Malta.

The center will generate 100 additional jobs at the college, officials said. IBM and Tokyo Electron are among other partners in the new center.

Officials portrayed the announcement as a further step in the state’s efforts to establish the Albany campus as one of the leading nanotechnology research centers in the world.

“Today’s announcement is a direct result of Governor Cuomo’s innovation-driven economic development model,” said Alain Kaloyeros, president and CEO of SUNY Polytechnic Institute. “In partnership with GlobalFoundries, IBM and Tokyo Electron, we will leverage our combined expertise and technological capabilities to meet the critical needs of the industry and advance the introduction of this complex technology.”

GlobalFoundries’ Fab 8 is expected to start volume commercial production of 14-nanometer chips this year, but researchers are working on making the chip circuits even smaller, and EUV technology is considered critical to shrinking circuits further, which will make them more efficient and allow more information to be packed onto each chip.

“GlobalFoundries is committed to an aggressive research road map that continually pushes the limits of semiconductor technology,” said Gary Patton, chief technology officer and senior vice president of research and development at GlobalFoundries. “Together with SUNY Poly, the new center will improve our capabilities and position us to advance our process geometries at 7 nm and beyond.”

Extreme ultraviolet lithography is a manufacturing technique that uses short wavelengths of light to create minuscule patterns on integrated circuits.

The technology is considered critical to achieving the cost, performance and power improvements needed to meet future demands in cloud computing, big data, mobile devices and other emerging technologies, the partners said.

A key component of the center will be the installation of an NXE:3300 extreme ultraviolent scanner, a state-of-the-art tool for the development and manufacturing of semiconductor technologies at 7 nm and below made by ASML, a Dutch manufacturer of photolithography tools. One ASML EUV scanner is already in place at SUNY Poly.

The advanced research work is expected to go into future manufacturing operations at Fab 8, where just under 3,000 people work.

“EUV technology has emerged from R&D, and the new center will meet the rising demand to commercialize this technology and put it in the hands of end-users,” said Gishi Chung, a senior vice-president at Tokyo Electron, which is among the companies that supply equipment to GlobalFoundries.

More than 4,000 people work at SUNY Poly in a variety of public-private research activities.

Reach Gazette reporter Stephen Williams at 395-3086, [email protected] or @gazettesteve on Twitter.

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